2
| CuNi3Si1-R300 |
固溶處理;R300 |
≥300 |
≈110* |
≥20(A100), ≥25(A11.3), ≥30(A) |
|
|
2
| CuNi3Si1-H070 |
固溶處理;H070 |
|
|
|
HB: 70~100; HV: 75~105 |
|
2
| CuNi3Si1-R580 |
固溶處理+冷作;R580 |
≥580 |
≈550* |
≥5(A100), ≥6(A11.3), ≥8(A) |
|
|
2
| CuNi3Si1-H160 |
固溶處理+冷作;H160 |
|
|
|
HB: 160~210; HV: 170~220 |
|
30
| CuNi3Si1-R520 |
固溶處理+冷作;R520 |
≥520 |
≈480* |
≥8(A) |
|
|
30
| CuNi3Si1-H150 |
固溶處理+冷作;H150 |
|
|
|
HB: 150~200; HV: 155~205 |
|
50
| CuNi3Si1-R450 |
固溶處理+冷作;R450 |
≥450 |
≈390* |
≥10(A) |
|
|
50
| CuNi3Si1-H135 |
固溶處理+冷作;H135 |
|
|
|
HB: 135~185; HV: 140~190 |
|
2
| CuNi3Si1-R690 |
固溶處理+沉淀硬化;R690 |
≥690 |
≈570* |
≥6(A100), ≥8(A11.3), ≥10(A) |
|
|
2
| CuNi3Si1-H170 |
固溶處理+沉淀硬化;H170 |
|
|
|
HB: 170~220; HV: 180~230 |
|
2
| CuNi3Si1-R800 |
固溶處理+冷作+沉淀硬化;R800 |
≥800 |
≈780* |
≥6(A100), ≥8(A11.3), ≥10(A) |
|
|
2
| CuNi3Si1-H200 |
固溶處理+冷作+沉淀硬化;H200 |
|
|
|
HB: ≥200; HV: ≥210 |
|
30
| CuNi3Si1-R750 |
固溶處理+冷作+沉淀硬化;R750 |
≥750 |
≈710* |
≥10(A |
|
|
30
| CuNi3Si1-H190 |
固溶處理+冷作+沉淀硬化;H190 |
|
|
|
HB: ≥190; HV: ≥200 |
|
50
| CuNi3Si1-R700 |
固溶處理+冷作+沉淀硬化;R700 |
≥700 |
≈630* |
≥10(A |
|
|
50
| CuNi3Si1-H180 |
固溶處理+冷作+沉淀硬化;H180 |
|
|
|
HB: ≥180; HV: ≥190 |
|
2
| CuNi3Si1-M |
M |
不作規(guī)定 |
不作規(guī)定 |
不作規(guī)定 |
不作規(guī)定 |
|